JPH0528720Y2 - - Google Patents
Info
- Publication number
- JPH0528720Y2 JPH0528720Y2 JP12854485U JP12854485U JPH0528720Y2 JP H0528720 Y2 JPH0528720 Y2 JP H0528720Y2 JP 12854485 U JP12854485 U JP 12854485U JP 12854485 U JP12854485 U JP 12854485U JP H0528720 Y2 JPH0528720 Y2 JP H0528720Y2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- gas
- gas introduction
- electrode plate
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000012777 electrically insulating material Substances 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12854485U JPH0528720Y2 (en]) | 1985-08-22 | 1985-08-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12854485U JPH0528720Y2 (en]) | 1985-08-22 | 1985-08-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6237200U JPS6237200U (en]) | 1987-03-05 |
| JPH0528720Y2 true JPH0528720Y2 (en]) | 1993-07-23 |
Family
ID=31024312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12854485U Expired - Lifetime JPH0528720Y2 (en]) | 1985-08-22 | 1985-08-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0528720Y2 (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2627214B2 (ja) * | 1990-11-16 | 1997-07-02 | インターニックス株式会社 | 高速サンプル・ホールド回路 |
| JP4572100B2 (ja) * | 2004-09-28 | 2010-10-27 | 日本エー・エス・エム株式会社 | プラズマ処理装置 |
-
1985
- 1985-08-22 JP JP12854485U patent/JPH0528720Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6237200U (en]) | 1987-03-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH05198386A (ja) | プラズマの動的発生に対する非加熱型中空陰極を有する装置 | |
| TW366677B (en) | Plasma generating apparatus and ion source using the same | |
| CN103260329A (zh) | 一种带悬浮电极的等离子体射流装置 | |
| JP2012521627A (ja) | ターゲットに電子流を導くプラズマ生成装置 | |
| KR100876052B1 (ko) | 뉴트럴라이저 형태의 고주파 전자 소스 | |
| JPH0528720Y2 (en]) | ||
| JPH04259274A (ja) | 高入力に適した電気的ポンピングガスレーザ | |
| JPH08102278A (ja) | イオンビーム発生装置及び方法 | |
| JPS6137969A (ja) | プラズマｃｖｄ薄膜製造装置 | |
| KR100500427B1 (ko) | 상압플라즈마를 이용한 표면처리장치 | |
| JPS6293834A (ja) | イオン源 | |
| KR100672230B1 (ko) | 동공 음극 플라즈마 장치 | |
| JPH0266941A (ja) | エッチング装置 | |
| KR20050087405A (ko) | 고밀도 플라즈마를 발생하는 샤워헤드를 구비한화학기상증착장치 | |
| JP2745336B2 (ja) | マイクロ波誘導プラズマ点火装置 | |
| JPS63126286A (ja) | レ−ザ−装置 | |
| JP4174623B2 (ja) | 液体クロマトグラフ質量分析装置 | |
| JP2000212751A (ja) | 薄膜形成装置 | |
| JP2697413B2 (ja) | 高周波イオン源 | |
| JPH02149339A (ja) | マイクロ波プラズマ処理装置 | |
| JPS6226879A (ja) | 金属蒸気レ−ザ発振管 | |
| EP0180480A2 (en) | Gas lasers | |
| KR200311918Y1 (ko) | 레이저 방전셀의 전극연결장치 | |
| KR200288939Y1 (ko) | 상압플라즈마를 이용한 표면처리장치 | |
| JP2586081Y2 (ja) | プラズマ処理装置 |